VF-5300 Stocker Type Vertical Furnace for Mass Production
This vertical furnace with a built-in stocker processes 8-inch wafers at ultra-high temperatures in large batches.
This furnace is a semiconductor heat treatment system that can perform oxidation, diffusion, LPCVD, activation annealing and various other heat treatments.
Features
- Large batch, max 150 wafers batch processing
- Max 20 cassette stocks
- Excellent temperature control from low to medium high temperature range using an LGO heater
- High-speed wafer transfer by use of single/five wafers handling robot
- Equipped with an operator-friendly high performance control system
Overview
This model is a continuous large-batch, mass-production type vertical diffusion furnace equipped with a stocker for a maximum of 150 wafers (8-inch) or 20 cassettes. Thanks to the LGO heater, this furnace exhibits superior temperature characteristics over a range from low temperatures to ultra-high temperatures. This furnace can be used for a wide range of processing from low-temperature annealing, nitride (Si3N4), polysilicon (poly Si) and other material LPCVD to oxidation and diffusion. A molybdenum disilicide (MoSi2) heater can also be used to support SiC power device gate oxynitriding and other ultra-high temperature processing.
Specifications
| Outer dimension | W900×D2300×H3300 mm |
|---|---|
| Heater | LGO heater |
| Flat zone length | 960 mm |
| Wafer size | 6 to 8 inch |
| Batch size | 150 wafers |
| I/O port | 2 |
| Number of cassette stock | 20 (standard) |
| Finger | 5 wafers + single wafer |
| HOST communication | HSMS/GEM (Option) |
| Options | Forced-cooling system N2 load lock Thin wafer handling SMIF operation |
Applications
Customize
Related Solution Cases
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See Solution Cases
[case-007] Increasing Yield by Reducing Contaminants Within the Furnace
Reducing sediment with an automatic cleaning mechanism inside the furnace
- Polymide curing
- Resist curing
- VF-5300(B)
