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Vertical Furnace for Small Production and R&D

This small production type vertical furnace for experiments and research (R&D) achieves high-quality processing.
This furnace is compact and requires only a small installation area but is usable for a wide range of wafer diameters and exhibits the same temperature characteristics as those of mass-production furnaces.

Features

  • High performance processing for R&D
  • Mini batch, max 25 wafers batch processing
  • 2- to 8-inch and 300-mm wafer size are available
  • Equipped with a Light Gauge Over-bend heater to realize the same high temperature performance as mass-production equipment
  • Equipped with limited-function simple control system
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Overview

This vertical furnace for experiments, research (R&D) and small production can be used for a wide range of wafer sizes from 2- to 8-inch and up to 300-mm, and the size of mini batch can also be chosen from up to 25 wafers. Since the heater can be chosen from a Light Gauge Over-bend heater and various other heaters, process development is available with the same furnace opening structure and heater performance as those of mass-production furnaces. This furnace can be used for various silicon wafer treatments (LPCVD, oxidation and diffusion), silicon gate oxynitriding and activation annealing for power device (Si and SiC) development, and a wide range of other processes.

Specifications

Model VF-1000
Outer dimension W1500 × D1000 × H2130 mm
Heater Light Gauge Over-bend heater
Flat zone length to 250 mm
Wafer size to 8 inch
Batch size to 25 wafers
Options Forced-cooling system
N2 load lock
50 to 150 wafers of processing
300mm wafer handling

Related Solution Cases

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